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SILICON NITRIDE WAFERS Si3N4

WaferPro offers a variety of film processing options for your silicon needs.  This includes LPCVD nitride, and WaferPro can provide wafers with stoichiometric LPCVD nitride or low stress LPCVD nitride, as well as super low stress LPCVD nitride. We also offer high quality PECVD nitride, Low stress PECVD nitride, and PECVD OxyNitride. Wafer diameter is available from 2″ to 200mm and nitride thickness is available from 100Å to 20,000Å.

Any amount of quantity can be ordered with a minimum batch order of 25 wafers.

Types of LPCVD Nitride

1. Stoichiometric LPCVD nitride

Film thickness: 100Å – 4500Å on both sides

Film stress: =>800±50 MPa Tensile Stress

2. Low stress LPCVD nitride

Film thickness: 100Å – 20,000Å on both sides

Film stress: <250±50 MPa Tensile Stress

3. Super low stress LPCVD nitride

Film thickness: 100Å – 20,000Å on both sides

Film stress: <100±50 MPa Tensile Stress


Types of PECVD Nitride

1. PECVD nitride

Film thickness: 100Å – 5000Å on one side

Film stress: +400±50 MPa Tensile Stress

2. Low stress PECVD nitride

Film thickness: 100Å – 20,000Å on one side

Film stress: <250±50 MPa Tensile Stress

3. PECVD OxyNitride

Film thickness: 100Å – 20,000Å on one side

Film stress: -400±50 MPa Tensile Stress

LPCVD film

Our LPCVD and PECVD nitride is stable and highly consistent. It can give you excellent coverage of edges, high thermal stability, and very good uniformity.

Contact one of our sales representative today!